Photocatalytic Removal of Nickel from Aqueous Solutions Using Ultraviolet‐Irradiated TiO2

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Wen‐Yuan Lin and Krishnan Rajeshwar

© 1997 ECS - The Electrochemical Society
Journal of The Electrochemical Society,Volume 144, Number 8Citation Wen‐Yuan Lin and Krishnan Rajeshwar 1997 J. Electrochem. Soc. 144 2751DOI 10.1149/1.1837891

Wen‐Yuan Lin

AFFILIATIONS

Department of Chemistry and Biochemistry, The University of Texas at Arlington, Arlington, Texas 76019‐0065

Krishnan Rajeshwar

AFFILIATIONS

Department of Chemistry and Biochemistry, The University of Texas at Arlington, Arlington, Texas 76019‐0065

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1945-7111/144/8/2751

Abstract

The photocatalytic removal of Ni(II) using ultraviolet (UV)‐irradiated suspensions is described. The photocatalytic reaction is shown to be electron‐mediated, and occurs both via direct electron transfer from the photoexcited particles to Ni(II), and an indirect route as described by previous authors. The latter requires the presence of an organic additive (acetate, formate, or methanol) that generates an intermediate radical reductant via an initial hole‐mediated reaction The effects of inorganic anions (chloride, sulfate) on the rate of Ni(II) removal are described as are those of other variables including dose and solution pH. The direct electron‐transfer route is shown to be kinetically sluggish, although it can be made fast by the addition of facile hole acceptors. The dark adsorption of Ni(II) on the (anatase) surface is also quantified in a chloride medium. The present data are discussed within the framework of previous studies on the photocatalytic deposition of Ni(II) and other metal ions.

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